Method and apparatus for reviewing defects by detecting images having voltage contrast
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United States of America Patent
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Nov 11, 2008
Grant Date -
Sep 27, 2007
app pub date -
Feb 9, 2007
filing date -
Mar 24, 2006
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Abstract
In a traditional method for automatically obtaining high-magnification images of defects by using an electron microscope for defect-reviewing of a semiconductor wafer, high-magnification images of a voltage contrast changing part are obtained in the case of defects generating voltage contrast change, this made difficult to observe defects themselves generating voltage contrast change. In the present invention, based on energy of secondary electron to be detected, after obtaining two types of images, namely an image making voltage contrast conspicuous easily, and an image not making it easily, and acquiring a shape change area adjacent to a voltage contrast change area based on this area as a defect location, a high-magnification image can automatically be obtained.
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