Exposure apparatus, and device manufacturing method
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United States of America Patent
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Nov 27, 2012
Grant Date -
Jul 30, 2009
app pub date -
Mar 24, 2009
filing date -
Jun 19, 2003
priority date (Note) -
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status (Latency Note)
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Abstract
A lithographic projection apparatus includes an illumination system that conditions a radiation beam, a support structure that holds a patterning device, the patterning device being capable of imparting the radiation beam with a pattern. A substrate table that holds a substrate, and a projection system that projects the patterned radiation beam onto a target portion of the substrate. In addition, a liquid supply system provides a liquid to a space between the projection system and the substrate, the liquid supply system having a member. A liquid seal device forms a liquid seal between the member and the substrate.
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