Electro hydrodynamic method for the preparation of a thin semiconductor film
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United States of America Patent
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Sep 13, 1988
Grant Date -
N/A
app pub date -
Oct 14, 1986
filing date -
Oct 4, 1985
priority date (Note) -
Expired
status (Latency Note)
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Abstract
A method of preparing a thin film of a semiconductor material on a substrate, in which charged microdroplets of the semiconductor material or a constituent thereof are generated by electrohydrodynamic (EHD) extraction of the droplets from a meniscus forced at an elongate tip of a nozzle containing the material in a molten state, the EHD extraction occurring under the influcence of a high electric field produced by an extractor electrode adjacent the tip of the nozzle. The microdroplets are then accelerated away from the elongate tip of the nozzle to form a two-dimensional ribbon-like beam or blanket of the charged microdroplets. The two-dimensional beam is directed onto the trailing edge of a target carried on a moving substrate such that a film of the semiconductor material is formed on the substrate by deposition of the microdroplets on the trailing edge of the moving target.
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