Wafer supporting device of a sputtering apparatus
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United States of America Patent
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Nov 22, 2011
Grant Date -
Dec 25, 2008
app pub date -
Jun 25, 2007
filing date -
Jun 25, 2007
priority date (Note) -
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Abstract
A wafer supporting device of a sputter apparatus includes a pedestal positioned in a sputtering chamber and used to load a wafer for sputtering, a deposition ring having a recess positioned on a peripheral portion of the pedestal, and a cover ring positioned on the pedestal and the deposition ring. The cover ring has a gate corresponding to the recess.
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