Method and apparatus for cleaning process monitoring

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United States of America Patent

PATENT NO 11926017
APP PUB NO 20210252668A1
SERIAL NO

17308767

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A cleaning process monitoring system, comprising: a cleaning container comprising an inlet for receiving a cleaning solution and an outlet for draining a waste solution; a particle detector coupled to the outlet and configured to measure a plurality of particle parameters associated with the waste solution so as to provide a real-time monitoring of the cleaning process; a pump coupled to the cleaning container and configured to provide suction force to draw solution through the cleaning system; a controller coupled to the pump and the particle detector and configured to receive the plurality of particle parameters from the particle detector and to provide control to the cleaning system; and a host computer coupled to the controller and configured to provide at least one control parameter to the controller.

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First Claim

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Chien-Shen Hsinchu, TW 3 2
Chen, Y J Taoyuan, TW 3 13
Hsieh, Yu-Hsuan New Taipei, TW 8 4
Kuo, Danny Taipei, TW 2 2
Lo, Hsuan New Taipei, TW 2 2
Tseng, Yu-Ping Taipei, TW 6 2
Wang, Charlie Hsinchu, TW 10 39
Yeung, Wai-Ming Hsinchu, TW 2 2

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