Plasma surface treatment system and plasma surface treatment method
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United States of America Patent
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Feb 21, 2006
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app pub date -
Mar 17, 2004
filing date -
Mar 26, 2003
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Abstract
A plasma surface treatment system for irradiating a surface of a substrate to be treated with a nitrogen plasma excited by a high-frequency electric field to introduce nitrogen into the surface of the substrate comprises a pulse modulator for pulse modulation of the high-frequency electric field. By applying the high-frequency electric field in a pulsed form, it is possible to realize a nitriding by which the peak of nitrogen concentration is located at a shallower position and a desired nitrogen concentration can be obtained.
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