Optical system with nanoscale projection antireflection layer/embossing
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United States of America Patent
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May 5, 2009
Grant Date -
Nov 2, 2006
app pub date -
Apr 28, 2005
filing date -
Apr 28, 2005
priority date (Note) -
Expired
status (Latency Note)
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Abstract
An optical system having a radiation transparent member and an anti-reflective embossment embossed into at least one surface of the transparent member. The embossment has spaced structures configured to permit incident radiation to pass through the embossment and the radiation transparent member, and to, at least, attenuate reflection of the incident radiation off the embossment. The structures are maximally spaced from one another by a subwavelength of the incident radiation.
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