Semiconductor apparatus and semiconductor apparatus leak inspection method

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United States of America Patent

PATENT NO 11967537
APP PUB NO 20210313242A1
SERIAL NO

17268943

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Abstract

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A semiconductor device, a leak detection device, an outer wall, and a separation wall are provided on a substrate. A first hollow structure in contact with the semiconductor device and a second hollow structure in contact with the leak detection device are separated by the separation wall and formed in a hermetically sealed state. At least a part of a portion of the leak detection device in contact with the second hollow structure is made of a corrodible metal or an alloy containing a corrodible metal. At least a part of the outer wall is in contact with the second hollow structure.

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Patent Owner(s)

  • MITSUBISHI ELECTRIC CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hisaka, Takayuki Tokyo, JP 13 45

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