Automated process control using optical metrology with a photonic nanojet
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United States of America Patent
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Dec 29, 2009
Grant Date -
Sep 25, 2008
app pub date -
Mar 20, 2007
filing date -
Mar 20, 2007
priority date (Note) -
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Abstract
A fabrication cluster can be controlled using optical metrology. A fabrication process is performed on a wafer using a fabrication cluster. A photonic nanojet, an optical intensity pattern induced at a shadow-side surface of a dielectric microsphere, is generated. An inspection area on the wafer is scanned with the photonic nanojet. A measurement is obtained of the retroreflected light from the dielectric microsphere as the photonic nanojet scans the inspection area. The existence of a structure in the inspection area is determined with the obtained measurement of the retroreflected light. One or more process parameters of the fabrication cluster is adjusted based on the determination of the existence of the structure in the inspection area.
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