Lithographic apparatus, combination of lithographic apparatus and processing module, and device manufacturing method
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 16, 2010
Grant Date -
Jun 19, 2008
app pub date -
Oct 12, 2006
filing date -
Oct 12, 2006
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A lithographic apparatus configured to transfer a pattern from a patterning device onto a substrate includes an integrated post-exposure bake device, the post-exposure bake device configured to subject the substrate to a predefined temperature cycle. A post-exposure bake step of the substrate (a temperature cycle) is executed within a predetermined time period after the transfer of the pattern. The lithographic apparatus may be combined with a processing system having one or more processing modules. More efficient use may be made of the combination, allowing flexibility for a device manufacturing method.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully