Apparatus and method to confine plasma and reduce flow resistance in a plasma reactor
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United States of America Patent
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Sep 8, 2009
Grant Date -
Dec 25, 2008
app pub date -
Aug 29, 2008
filing date -
Apr 17, 2003
priority date (Note) -
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Abstract
An apparatus configured to confine a plasma within a processing region in a plasma processing chamber. In one embodiment, the apparatus includes a ring that has a baffle having a plurality of slots and a plurality of fingers. Each slot is configured to have a width less than the thickness of a plasma sheath contained in the processing region.
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