Apparatus for plasma synthesis of metal oxide nanopowder
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United States of America Patent
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Mar 10, 2009
Grant Date -
Oct 6, 2005
app pub date -
Mar 25, 2005
filing date -
Apr 24, 2001
priority date (Note) -
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Abstract
is disclosed. The metal compound vapour is reacted with an oxidizing gas in electrically induced RF frequency plasma thus forming a metal oxide vapour. The metal oxide vapour is rapidly cooled using a highly turbulent gas quench zone which quickly halts the particle growth process, yielding a substantial reduction in the size of metal oxide particles formed compared with known processes. The metal compound vapour can also react with a doping agent to create a doped metal oxide nanopowder. Additionally, a process and apparatus for the inline synthesis of a coated metal oxide is disclosed wherein the metal oxide particles are coated with a surface agent after being cooled in a highly turbulent gas quench zone.
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