Adaptive control method for rapid thermal processing of a substrate
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United States of America Patent
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Jul 15, 2008
Grant Date -
Oct 11, 2007
app pub date -
Mar 30, 2006
filing date -
Mar 30, 2006
priority date (Note) -
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Abstract
The present invention generally relates to methods for the rapid thermal processing (RTP) of a substrate. Embodiments of the invention include controlling a thermal process using either a real-time adaptive control algorithm or by using a control algorithm that is selected from a suite of fixed control algorithms designed for a variety of substrate types. Selection of the control algorithm is based on optical properties of the substrate measured during the thermal process. In one embodiment, a combination of control algorithms are used, wherein the majority of lamp groupings are controlled with a fixed control algorithm and a substantially smaller number of lamp zones are controlled by an adaptive control algorithm.
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