Manufacturing methods of semiconductor image sensor devices

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11189654
APP PUB NO 20200312894A1
SERIAL NO

16900985

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Abstract

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A plurality of radiation-sensing doped regions are formed in a substrate. A trench is formed in the substrate between the radiation-sensing doped regions. A SiOCN layer is filled in the trench by reacting Bis(tertiary-butylamino)silane (BTBAS) and a gas mixture comprising N2O, N2 and O2 through a plasma enhanced atomic layer deposition (PEALD) method, to form an isolation structure between the radiation-sensing doped regions.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chang, Chao-Ching Kaohsiung, TW 22 59
Chou, Chia-Hsing Tainan, TW 10 69
Huang, Chih-Hui Tainan, TW 49 675
Lee, Chin-Szu Taoyuan, TW 55 73
Li, Sheng-Chan Tainan, TW 60 120
Lin, Min-Hui Tainan, TW 14 62
Lin, Yi-Ming Tainan, TW 42 92
Tsai, Jian-Shin Tainan, TW 20 78
Wu, Cheng-Yi Taichung, TW 48 116

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