Mask alignment, rotation and bias monitor utilizing threshold voltage dependence

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United States of America Patent

PATENT NO 8531203
APP PUB NO 20110304350A1
SERIAL NO

12813804

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Abstract

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The present invention provides a method and apparatus for measuring alignment, rotation and bias of mask layers in semiconductor manufacturing by examining threshold voltage variation.

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Patent Owner(s)

  • INTERNATIONAL BUSINESS MACHINES CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Christensen, Todd A Rochester, US 55 234
Paschal, Matthew J Rochester, US 13 195
Sheets,, II John E Zumbrota, US 133 573

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