Forming method of component and plasma processing apparatus

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United States of America

PATENT NO 11967487
APP PUB NO 20210366691A1
SERIAL NO

16646258

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Abstract

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A forming method of a component for use in a plasma processing apparatus includes irradiating, while supplying a source material of a first ceramic and a source material of a second ceramic different from the first ceramic, an energy beam to the source material of the first ceramic and the source material of the second ceramic.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kaneko, Shota Miyagi, JP 16 15
Nagaseki, Kazuya Miyagi, JP 89 2707
Saito, Michishige Miyagi, JP 27 227

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