MEMS devices and methods of forming same

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United States of America Patent

PATENT NO 11180365
SERIAL NO

16665468

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Abstract

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A microelectromechanical system (MEMS) device may include a MEMS structure over a first substrate. The MEMS structure comprises a movable element. Depositing a first conductive material over the first substrate and etching trenches in a second substrate. Filling the trenches with a second conductive material and depositing a third conductive material over the second conductive material and the second substrate. Bonding the first substrate and the second substrate and thinning a backside of the second substrate which exposes the second conductive material in the trenches.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chu, Chia-Hua Zhubei, TW 190 2468
Lee, Jiou-Kang Zhubei, TW 37 291
Lee, Te-Hao Hsinchu, TW 23 273
Liang, Kai-Chih Zhubei, TW 27 380
Lin, Chung-Hsien Hsinchu, TW 82 1318

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