Illumination assembly, method for providing a radiation beam, lithographic projection apparatus and device manufacturing method

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United States of America Patent

PATENT NO 7116400
APP PUB NO 20050270510A1
SERIAL NO

10858409

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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The invention relates to an illumination assembly, including a beam expander being arranged for receiving from a radiation source a radiation beam directed in a first direction (z) and for expanding the beam with a first magnification factor in a second direction (x) and with a second magnification factor in a third direction (y). The first, second and third directions being substantially mutually orthogonal. The illumination assembly further includes a beam splitter that is arranged for splitting the radiation beam in two split radiation beams split in at least one of the second and third direction, the propagation direction of the split radiation beams being substantially in the first direction. The beam splitter is further arranged for delivering the split radiation beams to the beam expander, of which at least one of the magnification factors is adjustable.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Botma, Hako Eindhoven, NL 18 165

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