Semiconductor device, method of generating layout diagram and system for same
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United States of America Patent
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Nov 8, 2022
Grant Date -
Jul 30, 2020
app pub date -
Jan 13, 2020
filing date -
Jan 29, 2019
priority date (Note) -
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Abstract
A semiconductor device includes: an active area in a transistor layer; contact-source/drain (CSD) conductors in the transistor layer; gate conductors in the transistor layer, and interleaved with the CSD conductors; VG structures in the transistor layer, and over the active area; and a first gate-signal-carrying (GSC) conductor in an M_1st layer that is over the transistor layer, and that is over the active area; and wherein long axes correspondingly of the active area and the first GSC conductor extend substantially in a first direction; and long axes correspondingly of the CSD conductors and the gate conductors extend substantially in a second direction, the second direction being substantially perpendicular to the first direction.
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