Apparatus for processing a semiconductor
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United States of America Patent
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Aug 29, 2006
Issued Date -
N/A
app pub date -
Aug 2, 1996
filing date -
Dec 4, 1992
priority date (Note) -
Expired
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Abstract
A multi-chamber system for providing a process of a high degree of cleanliness in fabricating semiconductor devices such as semiconductor integrated circuits. The system comprises a plurality of vacuum apparatus (e.g., a film formation apparatus, an etching apparatus, a thermal processing apparatus, and a preliminary chamber) for fabrication of semiconductor devices. At least one of these vacuum apparatuses is a laser.
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