Monitor wafer measuring method and measuring apparatus

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United States of America Patent

PATENT NO 11862495
APP PUB NO 20220406636A1
SERIAL NO

17598807

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Abstract

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The present invention relates to a monitor wafer measuring method and measuring apparatus. The monitor wafer measuring method comprises the following steps: fixing a product wafer, the product wafer having several alignment marks and product measuring sites corresponding respectively to the alignment marks; determining the product measuring sites according to the alignment marks; and placing a monitor wafer, a projection of the monitor wafer in a vertical direction being aligned with and coinciding with the product wafer. The present application can reduce or even eliminate positional errors of the monitor wafer during a measurement process, such that product-level measuring position accuracy can be achieved for the monitor wafer and further, the measuring machine itself and process changes can be monitored in a better way.

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Patent Owner(s)

Patent OwnerAddress
CHANGXIN MEMORY TECHNOLOGIES INC230601 NO 388 XINGYE AVENUE AIRPORT INDUSTRIAL PARK HEFEI ECONOMIC AND TECHNOLOGICAL DEVELOPMENT ZONE ANHUI PROVINCE HEFEI CITY ANHUI PROVINCE 230601

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Zhu, He Hefei, CN 85 116

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