Particle suppression systems and methods

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11137694
SERIAL NO

16629337

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Abstract

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A lithographic apparatus that includes an illumination system that conditions a radiation beam, a first stationary plate having a first surface, and a reticle stage defining, along with the first stationary plate, a first chamber. The reticle stage supports a reticle in the first chamber, and the reticle stage includes a first surface spaced apart from a second surface of the first stationary plate, thereby defining a first gap configured to suppress an amount of contamination passing from a second chamber to the first chamber. The first stationary plate is between the reticle stage and both the illumination system and a projection system configured to project a pattern imparted to the radiation beam by the patterning device onto a substrate.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.; ASML HOLDING N.V

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Boonen, Marcel Joseph Louis Dommelen, NL 1 0
Brinkert, Jacob Schalkhaar, NL 18 96
Bruls, Richard Joseph Eindhoven, NL 42 523
Huang, Yang-Shan Veldhoven, NL 26 58
Kochersperger, Peter Conrad Easton, US 4 4
Nienhuys, Han-Kwang Utrecht, NL 35 130

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