Resist composition for electron beam or EUV (extreme ultraviolet) and method for forming resist pattern
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United States of America Patent
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Jun 15, 2010
Grant Date -
Nov 22, 2007
app pub date -
Sep 1, 2005
filing date -
Sep 9, 2004
priority date (Note) -
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Abstract
A resist composition for electron beam or extreme ultraviolet (EUV), comprising a resin component (A) which exhibits changed alkali solubility under action of acid, and a photoacid generator component (B) that generates acid on exposure, wherein the component (B) comprises at least one onium salt selected from the group consisting of onium salts having an anion represented by formula (b-0-1) or (b-0-2) shown below: ##STR00001## wherein X represents an alkylene group having 2 to 6 carbon atoms, in which at least one hydrogen atom is substituted with a fluorine atom; and each of Y and Z independently represents an alkyl group having 1 to 10 atoms, in which at least one hydrogen atom is substituted with a fluorine atom.
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