Monitoring pattern for detecting a defect in a semiconductor device and method for detecting a defect
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Jun 8, 2010
Grant Date -
Dec 27, 2007
app pub date -
May 17, 2007
filing date -
May 18, 2006
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A monitoring pattern for detecting a defect in a semiconductor device allows a voltage contrast inspection which may be verified by an electrical test where no special test pattern is required for the electrical test. The monitoring pattern includes a test pattern with line shapes arranged in parallel and spaced apart at predetermined linewidths and intervals, and an interconnection layer connected to the test pattern, where the test pattern is adapted to be charged with a specific potential to be displayed as a voltage contrast image when scanned with an electron beam.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully