Alignment systems and methods for lithographic systems
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United States of America Patent
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Nov 20, 2007
Grant Date -
Apr 20, 2006
app pub date -
Dec 6, 2005
filing date -
Sep 20, 2002
priority date (Note) -
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Abstract
An alignment system for a lithographic apparatus has a source of alignment radiation; a detection system that has a first detector channel and a second detector channel; and a position determining unit in communication with the detection system. The position determining unit is constructed to process information from said first and second detector channels in a combination to determine a position of an alignment mark on a work piece, the combination taking into account a manufacturing process of the work piece. A lithographic apparatus has the above mentioned alignment system. Methods of alignment and manufacturing devices with a lithographic apparatus use the above alignment system and lithographic apparatus, respectively.
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