Scatterometry target for determining CD and overlay

United States of America Patent

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Nov 11, 2008
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N/A
app pub date
Nov 20, 2007
filing date
Nov 20, 2007

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Expired

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Abstract

The invention can provide a method of processing a wafer using segmented multi-dimensional targets that can be used in Double-Patterning (D-P) procedures.

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Patent Owner(s)

TOKYO ELECTRON LIMITED

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G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

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Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Dixon, David	Austin, TX	62	1916

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Scatterometry target for determining CD and overlay

Number of patents in Portfolio can not be more than 2000

United States of America Patent

11943286

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PATENT NO	7449265
SERIAL NO	11943286
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11943286

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Family

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