2-dimensional patterning employing tone inverted graphoepitaxy
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United States of America Patent
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Feb 28, 2017
Grant Date -
Dec 8, 2016
app pub date -
Nov 27, 2012
filing date -
Nov 27, 2012
priority date (Note) -
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Abstract
After formation of a template layer over a neutral polymer layer, a self-assembling block copolymer material is applied and self-assembled. The template layer includes a first linear portion, a second linear portion that is shorter than the first linear portion, and blocking template structures having a greater width than the second linear portion. The self-assembling block copolymer material is phase-separated into alternating lamellae in regions away from the widthwise-extending portion. The blocking template structures perturb, and cause termination of, the lamellae. A cavity parallel to the first and second linear portions and terminating in self-alignment to the blocking template structures is formed upon selective removal of a polymeric block component. The pattern of the cavity can be inverted and transferred into the material layer to form fins having different lengths.
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