Methods for preparing low scatter optical coatings
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United States of America Patent
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Sep 23, 1997
Grant Date -
N/A
app pub date -
Mar 19, 1996
filing date -
Mar 19, 1996
priority date (Note) -
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Abstract
The present invention is directed to a sputtering method for preparing optical coatings having low light scattering characteristics by controlling the angle of incidence of the material being sputtered without significantly reducing the coating efficiency of the sputtering process. The angle of incidence is controlled by reducing the collision scattering of the material being sputtered and by intercepting the sputtered material that would without interception arrive at the surface to be coated at high angles of incidence. The collision scattering is reduced by utilizing a sputtering gas that has a mass less than the mass of the material being sputtered.
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