Thermophoretic protection of reticles
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United States of America Patent
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Jan 9, 2007
Grant Date -
Feb 3, 2005
app pub date -
Jul 31, 2003
filing date -
Jul 31, 2003
priority date (Note) -
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status (Latency Note)
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Abstract
A thermophoretic source may be contained within the packaging of a reticle during transport or otherwise to protect the reticle from particle contamination. For example, in advanced lithography technologies, very small particles may be thermophoretically attracted away from the reticle during transport so that cleaning on arrival may not be necessary in some cases.
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