Substrate temperature measurement by infrared transmission
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United States of America Patent
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May 24, 2011
Grant Date -
Aug 21, 2008
app pub date -
Feb 16, 2007
filing date -
Feb 16, 2007
priority date (Note) -
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status (Latency Note)
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Abstract
A method and apparatus for measuring a substrate temperature during a thermal process are provided. In one embodiment, an apparatus for measuring a substrate temperature during a thermal process includes an evacutable chamber, a substrate heater positioned to heat a substrate disposed in the chamber, and a sensor positioned to receive energy transmitted through the substrate while the substrate is heated by the substrate heater, wherein the sensor is configured to detect a metric indicative of transmittance. In another embodiment, a method for measuring a substrate temperature includes heating a substrate disposed in a chamber, detecting a change in transmittance of the substrate while heating, and determining a temperature of the substrate based on the change in transmittance.
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