Exposure apparatus
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United States of America Patent
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Apr 26, 2011
Grant Date -
Feb 7, 2008
app pub date -
Jul 26, 2007
filing date -
Aug 1, 2006
priority date (Note) -
In Force
status (Latency Note)
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Abstract
An exposure apparatus includes a projection optical system that projects a pattern of a reticle onto a wafer, a vacuum chamber in which the projection optical system is disposed, a partition provided in the vacuum chamber and dividing a first space (which is a space where at least a portion of the projection optical system exists) and a second space (which is a space other than the first space) from each other, a gas supplying unit that supplies gas to the first space, and a sealant that reduces flow of the gas supplied through a pipe into the second space.
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