Electron emission thin-film, plasma display panel comprising it and method of manufacturing them
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United States of America Patent
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Jan 9, 2007
Grant Date -
Mar 25, 2004
app pub date -
May 11, 2001
filing date -
May 11, 2000
priority date (Note) -
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Abstract
An electron emission thin-film with improved secondary electron emission characteristics compared with conventional ones, a plasma display panel including the electron emission thin-film, and their manufacturing methods. Using a vacuum deposition system, a protective layer that is an MgO thin-film is formed on a dielectric layer formed on a front glass substrate. At the time of deposition, angles that lines linking the central point of a target material for the protective layer respectively with the central point and both ends points of the front glass substrate form with the front glass substrate are exclusively in a range of 30 to 80 .degree.. This enables at least some of MgO columnar crystals constituting the protective layer to have flat planes that are inclined with respect to the surface of the thinfilm.
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