Method of observing secondary ion image by focused ion beam

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United States of America Patent

PATENT NO 6177670
SERIAL NO

09235667

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Abstract

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A high-resolution secondary ion image is observed by first and second processing steps. In the first step, the focus of the ion optics is adjusted while observing a secondary electron image at an image refresh rate of a few or several seconds. In the second step, secondary ions are detected with a secondary charged-particle detector without readjusting the focus of the ion optics. A secondary ion image is observed at a scanning rate of tens to hundreds of seconds/frame. Thus, a focused high-resolution secondary ion image is derived.

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Patent Owner(s)

  • HITACHI HIGH-TECH SCIENCE CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Sugiyama, Yasuhiko Chiba, JP 49 240

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