Radical source with contained plasma

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11201035
APP PUB NO 20190341226A1
SERIAL NO

15971778

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Described herein are technologies related to a radical source with a housing that includes a plasma cavity that is designed to contain a plasma created by a plasma generator. The housing has at least one gas injector designed to inject process gas into the plasma. The plasma produces radicals from the gas injected into the plasma. The cavity has an exit or opening formed therein that ejects the radicals from the cavity. The ejected radicals may be directed towards a subject wafer substrate under the radical source. This Abstract is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lane, Barton Austin, US 37 157
Ventzek, Peter Austin, US 52 385

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