Optimized contact resistance for stacked FET devices

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United States of America Patent

PATENT NO 11948944
APP PUB NO 20230054540A1
SERIAL NO

17404628

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Abstract

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Stacked FET devices having wrap-around contacts to optimize contact resistance and techniques for formation thereof are provided. In one aspect, a stacked FET device includes: a bottom-level FET(s) on a substrate; lower contact vias present in an ILD disposed over the bottom-level FET(s); a top-level FET(s) present over the lower contact vias; and top-level FET source/drain contacts that wrap-around source/drain regions of the top-level FET(s), wherein the lower contact vias connect the top-level FET source/drain contacts to source/drain regions of the bottom-level FET(s). When not vertically aligned, a local interconnect can be used to connect a given one of the lower contact vias to a given one of the top-level FET source/drain contacts. A method of forming a stacked FET device is also provided.

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Patent Owner(s)

  • INTERNATIONAL BUSINESS MACHINE CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Frougier, Julien Albany, US 305 835
Wu, Heng Guilderland, US 222 619
Xie, Ruilong Niskayuna, US 1423 10722
Zhang, Jingyun Albany, US 203 1067

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