Chemically amplified resist composition and method for forming patterned film using same
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United States of America Patent
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Oct 31, 2006
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app pub date -
Apr 5, 2005
filing date -
Apr 10, 2001
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Abstract
A chemically amplified resist composition which comprises a base resin reacting in the presence of an acid, a photo acid generator generating an acid upon exposure, and a compound having the combination of an acetal moiety and a site which is eliminated by an acid in its molecule, or which comprises a base resin, which is a copolymer having the combination of an acetal moiety and a site eliminated by an acid in one repeating unit and reacts in the presence of an acid, and a photo acid generator generating an acid upon exposure.
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