Apparatus and method for semiconductor fabrication

Number of patents in Portfolio can not be more than 2000

United States of America

PATENT NO 11286565
APP PUB NO 20200216957A1
SERIAL NO

16708737

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Importance

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Abstract

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An apparatus for processing a substrate is provided. The apparatus comprises a processing chamber and a showerhead. The showerhead is in the processing chamber and has a plurality of first holes with a first size in a first zone of the showerhead and a plurality of second holes with a second hole size in a second zone of the showerhead. The first hole size is different from the second hole size. The first zone is surrounded by the second zone. An area of the first zone is larger than an area of the second zone.

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Patent Owner(s)

  • XIA TAI XIN SEMICONDUCTOR (QING DAO) LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Joo, Chan-Sul Singapore, SG 3 0
Kim, Jee-Hoon Singapore, SG 22 95

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