Multi-layered structure characterization
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Mar 20, 2007
Issued Date -
N/A
app pub date -
Mar 12, 2003
filing date -
Mar 12, 2002
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A method and an apparatus (10) for characterising a multi-layered structure (28) during formation of said multi-layered structure are disclosed. The method includes the steps of measuring the complex reflectivity of the multi-layered structure (28) at a wavelength outside of the bandgap of the multi-layered structure (28) and calculating a complex coupling coefficient from the measured complex reflectivity of the multi-layered structure (28) continuously or at intervals during the formation process. The apparatus (10) includes an interferometer (24) for creating writing beams (20, 22) to form the multi-layered structure (28), such as a Bragg grating, in an optical fibre (16) and an interrogation unit (40) for measuring the complex reflectivity and for calculating the complex coupling coefficient of the multi-layered structure (28) and for producing a feedback sigal which is communicated back to the interfemometer (24). The interrogation unit (40) includes an optical circuit with Mach-Zehnder or Sganac/Michelson interferometer arrangement.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully