Lithographic apparatus and device manufacturing method
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United States of America Patent
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Jul 21, 2009
Grant Date -
Dec 7, 2006
app pub date -
Aug 17, 2006
filing date -
Mar 9, 2004
priority date (Note) -
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Abstract
A lithographic apparatus has a plurality of patterning arrays (e.g., 2, 4, etc.), which are spaced apart in an object plane. A combined, overlapped image of the patterning arrays is projected onto the substrate. Because the image is formed from radiation produced from spaced apart patterning arrays, the image arrives from different angles and has a higher effective numerical aperture (NA).
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