Method for correcting mask
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United States of America Patent
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Feb 1, 2011
Grant Date -
Feb 5, 2009
app pub date -
Sep 17, 2008
filing date -
Feb 17, 2003
priority date (Note) -
In Force
status (Latency Note)
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Abstract
There is provided a method for correcting a photo mask, which allows the difference between a test mask and a corrected mask with respect to an error of line width depending on coarse/dense pattern to be decreased when the photo masks are corrected by optical proximity effect correction.); and setting an exposing condition where an OPE characteristic becomes flat with respect of wide and narrow pitches by adjusting at least one of a numerical aperture (NA) and a coherence factor (σ) of an exposing device when the corrected mask is transferred.
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