Method and process for stochastic driven detectivity healing

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United States of America Patent

PATENT NO 11163236
APP PUB NO 20210048749A1
SERIAL NO

16993594

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Substrate processing techniques to alleviate missing contact holes, scummed contact holes and scummed caused bridging are disclosed. In one embodiment, electromagnetic radiation (EMR) absorbing molecules are utilized in a process that uses an initial patterned exposure followed by a flood exposure. In one embodiment, a Photo-Sensitized Chemically-Amplified Resist (PSCAR) resist process is utilized to form contact holes in which an initial exposure and develop process is performed followed by a flood exposure and a second develop process. In another embodiment, a process is utilized in which precursors of EMR absorbing molecules are incorporated into a layer underlying the resist layer. Thus, enhanced formation of EMR absorbing molecules will result at the interface of the resist layer and the underlying layer.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Carcasi, Michael Austin, US 30 53
Dinh, Congque Kumamoto, JP 3 1
Nagahara, Seiji Tokyo, JP 42 298
Somervell, Mark Hillsboro, US 25 162

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