Resist underlayer composition and method for forming pattern using same

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9416296
APP PUB NO 20160053132A1
SERIAL NO

14779769

Stats

ATTORNEY / AGENT: (SPONSORED)

Importance

Loading Importance Indicators... loading....

Abstract

See full text

An under-layer composition of resist having superior thermal stability, etching resistance, gap-filling property and void-preventing property, and a method for forming pattern using the same are disclosed. The under-layer composition of resist comprises: an aromatic ring containing polymer having the repeating unit of the following Formula 1; a compound of the following Formula 4; and an organic solvent.

Loading the Abstract Image... loading....

First Claim

See full text

Family

Loading Family data... loading....

Patent Owner(s)

Patent OwnerAddress
DONGJIN SEMICHEM CO LTD644 BAEKBEOM-RO SEO-GU INCHEON 22824

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Jae Hyun Seoul, KR 229 1825
Kim, Jong-Won Gyeonggi-do, KR 72 661
Lee, Jae Woo Gyeonggi-do, KR 97 582
Lee, Jung-Youl Gyeonggi-do, KR 13 88
Lim, Young Bae Gyeonggi-do, KR 2 2

Cited Art Landscape

Load Citation

Patent Citation Ranking

Forward Cite Landscape

Load Citation

Maintenance Fees

Fee Large entity fee small entity fee micro entity fee due date
7.5 Year Payment $3600.00 $1800.00 $900.00 Feb 16, 2024
11.5 Year Payment $7400.00 $3700.00 $1850.00 Feb 16, 2028
Fee Large entity fee small entity fee micro entity fee
Surcharge - 7.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge - 11.5 year - Late payment within 6 months $160.00 $80.00 $40.00
Surcharge after expiration - Late payment is unavoidable $700.00 $350.00 $175.00
Surcharge after expiration - Late payment is unintentional $1,640.00 $820.00 $410.00