Substrate support for chucking of mask for deposition processes

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United States of America

PATENT NO 11967516
SERIAL NO

17423689

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Abstract

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Embodiments of the disclosure include methods and apparatus for electrostatically coupling a mask to a substrate support in a deposition chamber. In one embodiment, a substrate support is disclosed that includes a substrate receiving surface, a recessed portion disposed about a periphery of the substrate receiving surface, an electrostatic chuck disposed below the substrate receiving surface, and a plurality of compressible buttons disposed within a respective opening formed in the recessed portion that form an electrical circuit with the electrostatic chuck.

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Patent Owner(s)

  • APPLIED MATERIALS INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chen, Jrjyan Jerry Campbell, US 43 591
Li, Jun Sunnyvale, US 1275 16409
Setty, Surendra Kanimihally San Jose, US 1 0
Shao, Shouqian Fremont, US 29 1254
Won, Tae Kyung San Jose, US 82 5854
Yadav, Sanjay D Morgan Hill, US 18 37

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