Wet cleaning inside of gasline of semiconductor process equipment

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 11661652
APP PUB NO 20190352775A1
SERIAL NO

16412798

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Abstract

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Embodiments described herein relate to a gas line cleaning system and a method of cleaning gas lines. The gas line cleaning system includes a connector having a first end and a second end, and a fluid system. The fluid system includes a fluid source configured to flow a fluid through a fluid conduit connected to the first end, and an ultrasonic transducer coupled to the fluid conduit configured to apply an ultrasonic energy to the fluid conduit to agitate the fluid. The ultrasonic energy creates a mechanical energy that reverberates in the fluid conduit and propagates into the fluid to remove particles that may have formed on an inside surface of a gas line connected to the second end and carry away particles inside the gas line.

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Patent Owner(s)

  • APPLIED MATERIALS INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chong, Halbert San Jose, US 12 11
Groechel, David W Los Altos Hills, US 43 1589
Peng, Gang Fremont, US 42 236
Pereira, Marcus Morgan Hill, US 1 1

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