Laser processing apparatus, semiconductor device manufacturing method, and amorphous silicon crystallization method

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United States of America Patent

PATENT NO 11187953
APP PUB NO 20190271871A1
SERIAL NO

16320069

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A laser processing apparatus includes: a laser light source that generates a laser beam; a first beam splitter on which the laser beam is incident; a second beam splitter on which the laser beam having passed through the first beam splitter is incident; and a homogenizer that controls an energy density of the laser beam emitted from the second beam splitter. The laser beam output from the homogenizer includes a p-polarized component and an s-polarized component, and a ratio of energy intensity of the p-polarized component to the s-polarized component is preferably not lower than 0.74 and not higher than 1.23 on a surface of the workpiece.

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Patent Owner(s)

  • THE JAPAN STEEL WORKS, LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chung, Suk-Hwan Kanagawa, JP 15 19
Machida, Masashi Kanagawa, JP 23 106

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