Light source intensity control systems and methods for improved light scattering polarimetry measurements

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United States of America Patent

PATENT NO 11860090
APP PUB NO 20220317041A1
SERIAL NO

17709792

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Abstract

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Systems and methods of performing a stress measurement of a chemically strengthened glass using a light-scattering polarimetry system include adjusting the intensity of a light beam from a light source in an illumination system using a rotatable half-wave plate and a first polarizer operably disposed between the light source and a rotating light diffuser that has a rotation time tR. The first polarizer is aligned with a second polarizer in a downstream optical compensator to have matching polarization directions by rotating the rotatable half-wave plate to a position where the exposure time tE falls within an exposure range tR≤tE. The method also includes performing an exposure using the exposure time tE to obtain the stress measurement. One or both of the half-wave plate and first polarizer can be tilted to avoid deleterious back-reflected light from entering the light source.

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Patent Owner(s)

Patent OwnerAddress
CORNING INCORPORATEDSP-TI-3-1 CORNING NY 14831

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Andrews, Ryan Claude Elmira, US 20 72
Bouzi, Pierre Michel Horseheads, US 4 5
Furnas, William John Elmira, US 11 22
Immerman, Jacob Corning, US 15 93
Jacobson, Jeremiah Robert Corning, US 4 5
Lindberg, Katherine Anne Corning, US 2 0
Olson, Evan Lewis Elmira, US 3 4
Wetmore, Nathaniel David Corning, US 9 37

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