Organic deposition apparatus and method of depositing organic substance using the same
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United States of America Patent
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Dec 31, 2013
Grant Date -
Oct 15, 2009
app pub date -
Oct 21, 2008
filing date -
Apr 14, 2008
priority date (Note) -
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Abstract
An organic material deposition system and method are provided. The organic material deposition apparatus may include a chamber having a processing space formed therein, a source supply device that generates an organic source and injects and diffuses the organic source into the processing space through a shower head provided in the processing space. The substrate is supported by a stage device that moves the substrate upward and downward within the processing space to adjust a distance between the substrate and the shower head. A pumping port provided at an upper positioned at an upper portion of the processing space provides a vacuum exhaust path that directs flow through the processing space toward the stage device. This allows an organic thin film with a uniform thickness to be deposited using an apparatus with a relatively simple configuration.
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