Multi-charged-particle-beam writing apparatus and multi-charged-particle-beam writing method
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United States of America Patent
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Feb 13, 2024
Grant Date -
Mar 16, 2023
app pub date -
Jul 28, 2022
filing date -
Sep 14, 2021
priority date (Note) -
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Abstract
In one embodiment, a multi-charged-particle-beam writing method includes performing a tracking operation such that, while a substrate placed on a stage moving continuously is being irradiated with multiple beams including a plurality of charged particle beams, deflection positions of the multiple beams follow movement of the stage, and applying the multiple beams to the substrate having a writing area including a plurality of rectangular regions arranged in a mesh during the tracking operation such that each of the plurality of rectangular regions is irradiated with the multiple beams. Each rectangular region includes a plurality of pixels each having a predetermined size and arranged in a mesh. At least one subset of the plurality of pixels is irradiated with the multiple beams in a first shot order and is then irradiated with the multiple beams in a second shot order different from the first shot order.
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