Hyperthermal neutral beam source and method of operating
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United States of America Patent
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Dec 29, 2009
Grant Date -
Jun 12, 2008
app pub date -
Feb 18, 2008
filing date -
Sep 29, 2005
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Abstract
Method and system for pumping a hyperthermal neutral beam source is described. The pumping system enables use of the hyperthermal neutral beam source for semiconductor processing applications, such as etching processes. An embodiment is described having a neutral beam source coupled to a processing chamber through a neutralizing grid. Control is provided by separately pumping the neutral beam source and the processing chamber.
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