Capacitor array structure and fabrication method thereof

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United States of America Patent

PATENT NO 11778804
APP PUB NO 20220320100A1
SERIAL NO

17474054

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Abstract

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Embodiments disclose a capacitor array structure and a method for fabricating a capacitor array structure. The method includes: after forming a first capacitor hole, providing a bonded wafer including a second substrate, a second supporting layer and a second sacrificial layer stacked in sequence, and bonding the bonded wafer to a stacked structure, wherein a surface of the second sacrificial layer away from the second supporting layer is a bonding surface; forming a second capacitor hole, the second capacitor hole penetrating into the bonded wafer at least along a thickness direction to expose the first capacitor hole, such that the first capacitor hole is connected with the second capacitor hole.

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Patent Owner(s)

  • CHANGXIN MEMORY TECHNOLOGIES, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Guo, Shuai Hefei, CN 51 179

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